Wafer metrology
1.Film Stress and Wafer Bow Measurement Systems. ( Room Temperature and High Temperatures – for Si or GaAs applications)We pioneered the optical lever (optilever)™ laser scanning technique for measuring film stress and wafer bow. Over 400 systems are installed worldwide. Our system is used routinely by fabs to monitor the film deposition process, which if not controlled, could lead to delamination, cracking and void formation in the wafer. 2.Integrated Metrology Annealing Chamber ( Rapid characterization of new materials
Some topics in this essay:
Shrinkage Reflectivity, Si GaAs, Adhesion Testers, Etching FSM, Rs Metal, Chamber Rapid, MEMs Optoelectronic, Systems Ultra, Temperature Temperatures, Epi SiGe, wafer bow, si gaas, fsm 900tc-vac, stress wafer, stress wafer bow, measurement systems,
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Approximate Word count = 359
Approximate Pages = 1 (250 words per page double spaced)
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