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Chemical Vapor Deposition

Although these are all different types of chemical vapor deposition they all use the same basic formula to create the same basic product. But don't think that these are the only ways that this can be done. There is also other film growing techniques. These are a bite different in the sense that they take chemicals from the liquid state to the solid state. These include spray coating; spin coating, electroplating and liquid phase epitaxy.
             Chemical Vapor Deposition is a process where a film of one material is formed onto another material. This happens when chemicals are reacted together in a gaseous or vapor phase to form a film. This method is widely used in all sort of field for depositing thin films of a variety of materials. The semi-conductor industry is a huge user of this process but there are many other industries that use this to coat their own materials with another. Including the coating of drill bits with synthetically grown diamonds.
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             Before we start describing what goes on in the lab with chemical vapor deposition we must first consider a couple things. Volatility is one thing to consider. Vapor pressure is one of the main ingredients to chemical vapor deposition and rarely do we find simple molecules with high vapor pressure. Vapor pressure is something that cannot be controlled because it is determined by molecular weight and molarity. These are a result of structure and bonding. The only thing that we can control is the temperature and how it is pumped into the reactor. Stability and reactivity is another thing to consider especially when we are considering safety. The bond strength of a molecule has a direct relation with bond dissociation energy with directly affects the process temperature and film composition of our end product. .
             We also need to consider the stability at different temperatures because that will determine how we deliver and store the molecules in the reactor.


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